Inorganics - Chemical Mechanical Polishing (CMP) Slurries and Solutions
Chemical Mechanical Polishing (CMP) Slurries and Solutions at GFS Chemicals
Components and Blends Now Available
Introduction: GFS Chemicals is ideally suited to provide individual component chemicals as well as selected finished blends for specific applications to the semiconductor and electronics industries:
- Nearly 80 years of experience in the manufacture and distribution of high purity chemicals for its analytical reagent and electronics industry customers.
- Over five years of experience in the manufacture and distribution of submicron polymer technologies for turbidity calibration standards.
- Over three years of experience in the manufacture and distribution of nano oxides of strictly controlled particle sizes for microscopy applications.
- Professional staff with over fifteen years of experience in the semiconductor fabrication and crystal growth, ohmic contacts, and surface engineering sciences, ready to help with your specific need(s).
High-Purity CMP Components Available from GFS Chemicals: Individual chemicals that you the customer can use to build your own CMP slurries and solutions.
Oxidizers: GFS Chemicals started in 1928 with oxidizers. Our business continues to revolve around oxidizers. If you desire a specific oxidizer, or a specific oxidizer purity, and you don’t see it here, chances are we can make it or know where to get it…just check out the extent of our online catalog
Buffers: Our successful analytical standards business is a result of successful manufacturing of bulk high purity raw materials. Your business demands the same high purity standards. Our catalog is brimming with buffers such as:
High Purity Phosphates High Purity Quaternary Salts
Etchants:Difficult-to-etch substrates such as silica masks, nitride dielectrics or wide band gap semiconductors, titanates, niobates, and perovskites frequently demand the use of “persuasion” to chemically react with the substrate. Because we manufacture specialty fluoride chemicals, a wide range of high purity specialty fluorides (including quaternary fluorides) is available from GFS.
Polishing Compounds: While traditionally not known for polishing compounds, GFS has been manufacturing nano compounds of stringent particle size tolerances for over three years that are very effective as polishing agents. These include:
Ceria Alumina Zirconia
Silica Titanium Dioxide Tin Oxide
Spinels Organic Polymers Silicon Nitride
Specialty CMP Blends Available from GFS Chemicals: While certainly not a recognized name in the CMP business, GFS Chemicals acknowledges that every successful company needs consistent products to meet the needs of niche markets or customers. Examples of specialty CMP blends available from GFS include:
Silver CMPs – GFS Chemicals has been involved in silver chemistry for over 40 years. While not a widely used ohmic contact material, those silver (and silver alloy) contacts in use frequently require not only polishing, but also a means to ensure high electrical conductivity after repeated use. Contact GFS Chemicals about CMPs for use on silver substrates.
Iridium CMPs – Iridium is occasionally added to platinum and other PGM ohmic contacts as a hardening agent, and has been used experimentally as a masking agent. It is frequently observed that the degree to which these Ir-containing contacts can be polished is not to the same degree as similar contacts that do not contain Ir. Chemically polishing Ir and Ir-containing contact materials requires a different approach than used in traditional contacts. Contact GFS Chemicals about CMPs for use on Ir and Ir-containing substrates.
Tungsten and Tungsten Silicide CMPs – Tungsten and tungsten silicide are emerging contact materials, particularly for wide band gap semiconductors such as the gallium/indium nitrides. As such, an effective means to chemically polish these contact materials is necessary for certain markets. Contact GFS Chemicals about CMPs for use with W/WSi contact materials.
Gallium and Aluminum Nitride CMPs – Members of our professional staff have been working with GaN-based wide band gap semiconductor materials as well as AlN missile window materials for many years. Due to the radically different chemical reactivity of these materials compared to conventional semiconductors, an entirely different CMP approach is necessary in order to provide adequate performance in the fabricated device. Contact GFS Chemicals about CMPs for use on GaN/AlN substrates.
PbS and PbSe CMPs – Lead sulfide and lead selenide used for infrared detectors require ultrahigh purity both in the detector material itself as well as any processing solutions placed in contact with the semiconductor device and its contacts. Contact GFS Chemicals about ultrahigh purity CMPs for use on PbS/PbSe substrates.
Nickel Phosphide CMPs – Nickel phosphides with a phosphorus content greater than 10 wt. % are the non-magnetic substrates used in memory devices. Due to the high phosphorus content, specialized CMPs are required not only to produce a mirror smooth surface, but also to ensure minimal recrystallization of the Ni-P during subsequent bake cycles. Contact GFS Chemicals about CMPs for Ni-P applications.
Individual components as well as custom blends are just some of the CMP materials available from GFS Chemicals. You, the customer, know your specific needs more than we do. What can we do to help improve your efficiencies and bottom line?
877.534.0795
